Lawrence Technological University vs. Park University

Comparable Facts

Compare Lawrence Technological University in Southfield, MI with Park University in Parkville, MO on tuition, admissions, graduation, earnings, and student body data using the table above.

Park University is larger than Lawrence Technological University based on total student enrollment (5,736 students vs. 3,693 students)

Location, institution type, and student-faculty ratio

• Lawrence Technological University is located in Southfield, MI (Small City setting); Park University is in Parkville, MO (Large Suburban setting).
• Lawrence Technological University is a private, non-profit 4-year institution. Park University is a private, non-profit 4-year institution.
• Student-to-faculty ratio: Lawrence Technological University 11:1; Park University 13:1.

Lawrence Technological University vs. Park University Cost Comparison

Which college is more expensive, Lawrence Technological University or Park University? Published tuition is the sticker price; many students pay less after aid (see average net price below).

• The typical actual cost that students pay to attend (average net price) is less at Park University than Lawrence Technological University ($19,519 vs. $34,083).
• Living costs (room and board or off-campus housing budget) at Park University are 23% lower than at Lawrence Technological University ($9,190 vs. $11,930).
• Lawrence Technological University is 155.8% more expensive for in-state tuition than Park University (about $27,260 more per year; $44,760.00 vs. $17,500.00).
• Out-of-state tuition is 155.8% higher at Lawrence Technological University than at Park University (about $27,260 more per year; $44,760.00 vs. $17,500.00).
• A larger share of students receive grant aid at Lawrence Technological University than at Park University (100% vs. 93%).
• The average total grant financial aid received by Lawrence Technological University students is 143.1% larger than aid received by Park University students ($23,877 vs. $9,820).

Lawrence Technological University vs. Park University Admissions comparison

Which college is harder to get into, Lawrence Technological University or Park University? Typical SAT and ACT scores (same estimates as in the table above), middle 50% test ranges where reported, test score submission policy, deadlines, and acceptance rates summarize admission difficulty between Park University and Lawrence Technological University.

• Submitting SAT or ACT scores: Lawrence Technological University - Test-free; Park University - Not reported.
• Typical fall application deadline: Park University Aug 1, 2027.

Lawrence Technological University vs. Park University Graduation Outcomes Comparison

How do outcomes compare for Lawrence Technological University and Park University? Graduation rate, earnings, and student loan debt are common indicators. The bullets below summarize the same federal outcomes fields as the comparison table (College Scorecard / IPEDS where applicable).

• Lawrence Technological University's six-year graduation rate (44%) is higher than Park University's (39%).
• Graduates from Lawrence Technological University earn a median of about $10,200 more per year than Park University graduates about ten years after starting college ($59,800 vs. $49,600), per the same Scorecard earnings definition.
• Among federal student loan borrowers, Park University graduates have a $7,500 lower median loan debt than Lawrence Technological University graduates ($19,500 vs. $27,000).
• Among borrowers, Park University graduates have an estimated $78 lower median monthly federal student loan payment than Lawrence Technological University graduates ($201 vs. $279).
• More Lawrence Technological University graduates are actively paying back their federal student loan debt than former Park University students, three years after graduation. (64% vs. 52%)

Sources: U.S. Department of Education https://nces.ed.gov IPEDS and College Scorecard https://collegescorecard.ed.gov/. Values reflect the most recent year available in our dataset.